A reactive laser ablation source for the production of thin films

A discription of a thin film deposition source which is based upon the “Smalley metal cluster source” is presented. Our laser assisted molecular beam deposition source incorporates four major innovations: (1) placing the source so it sits external to the deposition chamber, (2) positioning the ablation target at an angle greater than 90° with respect to the laser entrance window, (3) placing the laser entrance window/lens further from the ablation target, and (4) the addition of a second optical window for laser alignment and in situ spectral analysis of the laser ablation plume. Novel molecules can be generated in this source through use of a reactive carrier gas. For example, employing a Ti target rod and O 2 carrier gas; flat, uniform micron thick thin films of TiO 2 can be easily generated.