Third‐harmonic generation measurement of nonlinearities in SiO2‐TiO2 sol‐gel films

Third‐harmonic generation has been used to measure the magnitude and phase of the nonlinear susceptibility χ(3)(3ω) of SiO2‐TiO2 sol‐gel thin films as a function of TiO2 concentration. Nonlinearities 20 times larger than those of fused silica were found, making such films useful for nonlinear optics...

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Veröffentlicht in:	Applied physics letters 1991-03, Vol.58 (11), p.1128-1130
Hauptverfasser:	Torruellas, W. E., Weller‐Brophy, L. A., Zanoni, R., Stegeman, G. I., Osborne, Z., Zelinski, B. J. J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Exact sciences and technology Fundamental areas of phenomenology (including applications) Optics Physics Wave optics Wave propagation, transmission and absorption
Online-Zugang:	Volltext
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Zusammenfassung:	Third‐harmonic generation has been used to measure the magnitude and phase of the nonlinear susceptibility χ(3)(3ω) of SiO2‐TiO2 sol‐gel thin films as a function of TiO2 concentration. Nonlinearities 20 times larger than those of fused silica were found, making such films useful for nonlinear optics in glass waveguides.
ISSN:	0003-6951 1077-3118
DOI:	10.1063/1.104392