Osseointegration evaluation of plasma nitrided titanium implants

There is a need for new techniques that modify metallic implant surfaces, resulting in good bone response for low density areas. Among the different techniques, plasma nitriding is being applied in biomedicine with excellent results. However, its use in titanium dental implants is very limited owing to high process temperatures (between 700 and 800°C) that result in distortions. In order to solve this problem, the authors used a new plasma method with a hollow cathode discharge configuration. Ti grade II dental implants were nitrided in a 20% N 2 -H 2 atmosphere at a temperature of 450°C, 150 Pa (1·5 mbar), for 1 h and inserted into rabbit tibias to assess osseointegration. The results showed that plasma nitriding caused a significant change in the surface texture of the nitrided implants and greater removal torque than that of the control implants.