Assessing the potential of non-pyrophoric Zn(DMP) for the fast deposition of ZnO functional coatings by spatial atomic layer deposition

Spatial atomic layer deposition (SALD) is a promising thin film deposition technique that enables fast, large-scale deposition and nanoscale thickness control by utilizing spatially separated precursor vapors and a substrate-specimen relative motion, while being feasible in atmospheric pressure conditions. This study explores the use of a non-pyrophoric precursor, Zn(DMP) 2 , in open-air SALD to produce ZnO, and compares the SALD processing speed, and thin film properties, as well as the environmental impact of using this precursor versus the more conventional diethylzinc (DEZ), whose pyrophoricity discourages open-air processing. For this purpose, a life cycle analysis (LCA) study was carried out. Our investigation shows that Zn(DMP) 2 open-air SALD can yield ZnO films faster than conventional ALD using DEZ, producing high purity ZnO films with a growth per cycle of 0.7 Å at 180 °C, which corresponds to 184 Å min −1 maximal growth rate. Emphasizing practical applications, the conformality of the ZnO coating produced around silver nanowire (AgNW) networks by Zn(DMP) 2 open-air SALD and the functionality of these protective coatings has also been demonstrated. The resulting transparent conductive nanocomposites had a substantially improved durability on par with their DEZ-synthesized counterparts. Growth rates, environmental impact, and functionality of Zn(DMP) 2 are explored for the spatial ALD of ZnO and compared to DEZ.