Wet-chemical intercalation of BiTaOBr with self-adaptive structural deformation for enhanced photocatalytic performance

A small specific surface area and severe charge carrier recombination greatly limit the photocatalytic efficiency of semiconductors. Herein, we developed a novel wet-chemical intercalation strategy by using the NaBH 4 reagent for in situ intercalation-assisted expansion and surface/interface reconstruction of Bi 4 TaO 8 Br, which exhibits an enhanced specific surface area and charge carrier separation features. This work highlights intercalation of semiconductors for achieving enhanced photocatalytic performance and provides a new idea to synergistically regulate the morphology and surface/interface composition of semiconductors. In this work, we report a novel wet-chemical intercalation strategy for in situ intercalation-assisted expansion and surface/interface reconstruction of Bi 4 TaO 8 Br.