Band alignment of ZrCO/MoS heterostructures under an electric field
Improving the sensitivity of MoS 2 -based photodetectors by constructing semiconductor heterostructures remains a challenge. To address this issue, the effects of interlayer spacing and vertical external electric fields on the interfacial interactions and electronic properties of Zr 2 CO 2 /MoS 2 he...
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Veröffentlicht in: | New journal of chemistry 2021-09, Vol.45 (36), p.1652-16528 |
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Hauptverfasser: | , , , , , , , , |
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Zusammenfassung: | Improving the sensitivity of MoS
2
-based photodetectors by constructing semiconductor heterostructures remains a challenge. To address this issue, the effects of interlayer spacing and vertical external electric fields on the interfacial interactions and electronic properties of Zr
2
CO
2
/MoS
2
heterostructures were investigated systematically by first-principles calculations. The results indicate that a stable interface with van der Waals interactions can form between Zr
2
CO
2
and MoS
2
, which complies with the type-II mechanism. By applying a vertical external electric field to the Zr
2
CO
2
/MoS
2
heterostructure or changing the interlayer spacing between the Zr
2
CO
2
and MoS
2
monolayers, both the band gap and heterostructure type at the Zr
2
CO
2
/MoS
2
interface can be modulated efficiently. It is remarkable that the band alignment of the Zr
2
CO
2
/MoS
2
heterostructure is more sensitive to the external electric field than to the interlayer spacing. When the electric field is from −0.5 to 0.5 V Å
−1
, the energy band of the Zr
2
CO
2
/MoS
2
heterostructure changes from 0.2 to 0.3 eV with a 0.1 V Å
−1
increase of electric field. The redistribution of charge density with the external electric field and interlayer coupling is revealed to account for the tunable energy bands. Therefore, the Zr
2
CO
2
/MoS
2
heterostructures with van der Waals interactions possess great potential to be used in high-performance photodetectors.
Tunable energy bands of Zr
2
CO
2
/MoS
2
heterostructures by an external electric field. |
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ISSN: | 1144-0546 1369-9261 |
DOI: | 10.1039/d1nj02440j |