Sub-monolayer Au cluster formation pulsed nozzle cluster deposition

Submonolayer coverages of chemically synthesised triphenylphosphine-protected Au 9 clusters on mica and TiO 2 substrates were achieved through the development of a Pulsed Nozzle Cluster Deposition (PNCD) technique under high vacuum conditions. This method offers the deposition of pre-prepared, solvated clusters directly onto substrates in a vacuum without the potential for contamination from the atmosphere. AFM and TEM were used to investigate the rate of gold cluster deposition as a function of cluster solution concentration and the number of pulses, with pulse number showing the most effective control of the final deposition conditions. TEM and XPS were used to determine that the clusters retained their unique properties through the deposition process. Methanol solvent deposited in the PNCD process has been shown to be removable through post-deposition treatments. A physical model describing the vapour behaviour and solvent evaporation in a vacuum is also developed and presented. Submonolayer coverages of chemically synthesised triphenylphosphine-protected Au 9 clusters on mica and TiO 2 substrates were achieved through the development of a Pulsed Nozzle Cluster Deposition (PNCD) technique under high vacuum conditions.