Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (VD) and azasilane

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane and N -methyl-aza-2,2,4-trimethylsilacyclopentane by molecular layer deposition (MLD). This process was studied in situ with a quartz crystal microbalance and the thin film was characterized by X-ray photoelectron spectroscopy, ATR-FTIR and high-resolution transmission electron microscopy. Two consecutive vapor-to-solid ring opening reactions were applied for thin film siloxane polymerization by molecular layer deposition (MLD).