Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applicationsElectronic supplementary information (ESI) available. See DOI: 10.1039/c8tc05273e

The investigation of the photoionization processes of a series of titanium oxo clusters evidenced that doping their organic shell with extended aromatic structures decreases their ionization energy and stabilises the resulting radical cations. Such tunability of their photochemistry arising from ligand exchange gives these hybrid compounds great potential as EUV photoresists. Aromatic structures in organic shell stabilize photoionization products of metal oxo clusters, a new type of materials for EUV lithography.