Structure and catalytic properties of novel copper isatin Schiff base complexesElectronic supplementary information (ESI) available. CCDC 1412864, 1538859, 1538860, 1538858, 1538861, 1538862, 1538863, 1538865, 1538868, 1538877, 1538873, 1538881, 1538878, 1538883, 1538876, 1538871, 1538874, 1538872, 1538866, 1538870, 1538882, 1538875, 1538879 and 1538880. For ESI and crystallographic data in CIF or other electronic format see DOI: 10.1039/c8nj02718h
Isatin Schiff base ligands in combination with redox active metal ions have the potential to behave as non-innocent ligands facilitating industrially important chemical reactions. The ligand structure is easily modified by introducing substituents in three different positions, affecting the electron...
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Sprache: | eng |
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Zusammenfassung: | Isatin Schiff base ligands in combination with redox active metal ions have the potential to behave as non-innocent ligands facilitating industrially important chemical reactions. The ligand structure is easily modified by introducing substituents in three different positions, affecting the electron density distribution that was evaluated by Mulliken charge analysis and cyclic voltammetry for a range of isatin derivatives. It was noticed that coordination of these ligands to copper(
ii
) bromide in alcohol resulted in copper reduction to Cu(
i
) species and alcohol oxidation. Compared to organic chemistry, the inorganic chemistry of these ligands remains poorly examined. Here, we present the structural study of sixteen novel copper complexes with mononuclear [Cu(L)
2
]Hal
2/1
and halo-bridged binuclear [Cu
2
(μ-Hal)
2
(L)
2
] structures (L = isatin Schiff base ligand; Hal = Cl, Br and I). Finally, application of the above complexes for alcohol oxidation was evaluated: the complexes selectively catalyse benzyl alcohol oxidation to the corresponding aldehyde with almost quantitative yields and high selectivity.
Isatin Schiff bases in combination with copper ions act as non-innocent ligands amplifying the alcohol oxidation process. |
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ISSN: | 1144-0546 1369-9261 |
DOI: | 10.1039/c8nj02718h |