Construction of GaN/Ga2O3 p-n junction for an extremely high responsivity self-powered UV photodetector

A self-powered ultraviolet photodetector was constructed with GaN/Ga 2 O 3 p-n junction by depositing n-type Ga 2 O 3 thin film on Al 2 O 3 single crystals substrate covered by p-type GaN thin film. The fabricated device exhibits a typical rectification behavior in dark and excellent photovoltaic characteristics under 365 nm and 254 nm light illumination. The device shows an extremely high responsivity of 54.43 mA W −1 , a fast decay time of 0.08 s, a high I light / I dark ratio of 152 and a high detectivity of 1.23 × 10 11 cm Hz 1/2 W −1 under 365 nm light with a light intensity of 1.7 mW cm −2 under zero bias. Such excellent performances under zero bias are attributed to the rapid separation of photogenerated electron-hole pairs driven by built-in electric field in the interface depletion region of GaN/Ga 2 O 3 p-n junction. The results strongly suggest that the GaN/Ga 2 O 3 p-n junction based photodetectors are suitable for applications in secure ultraviolet communication and space detection which require high responsivity and self-sufficient functionality. A self-powered ultraviolet photodetector with an extremely high responsivity (54.43 mA W −1 ) was fabricated by constructing p-n junction of GaN/Ga 2 O 3 films.