Unusual renormalization group (RG) flow and temperature-dependent phase transition in strongly-insulating monolayer epitaxial grapheneElectronic supplementary information (ESI) available. See DOI: 10.1039/c7ra05463g
By changing the measurement temperature ( T ), one can vary the effective sample size so as to study the renormalization group (RG) (or T -driven) flow of a semiconductor, a topological insulator, or a graphene device in the complex conductivity plane. Here we report RG flow of large-area, strongly...
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Sprache: | eng |
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Zusammenfassung: | By changing the measurement temperature (
T
), one can vary the effective sample size so as to study the renormalization group (RG) (or
T
-driven) flow of a semiconductor, a topological insulator, or a graphene device in the complex conductivity plane. Here we report RG flow of large-area, strongly disordered monolayer graphene epitaxially grown on SiC, which becomes insulating as
T
decreases for zero magnetic field. We observe cusp-like RG flow towards (
σ
xy
=
e
2
/
h
,
σ
xx
=
e
2
/
h
) where
σ
xy
and
σ
xx
are Hall conductivity and diagonal conductivity respectively. Such features, indicative of a fixed-temperature phase transition, have never been observed before and cannot be explained by existing RG models based on a modular symmetry group. Therefore, our results suggest the need for new theoretical models and experimental study leading to an understanding of strongly disordered two-dimensional materials such as graphene, few-layer black phosphorus, WSe
2
, and so on.
By changing the measurement temperature (
T
), one can vary the effective sample size so as to study the renormalization group (RG) (or
T
-driven) flow of a semiconductor, a topological insulator, or a graphene device in the complex conductivity plane. |
---|---|
ISSN: | 2046-2069 |
DOI: | 10.1039/c7ra05463g |