Chloride-accelerated Cu-Fenton chemistry for biofilm removalElectronic supplementary information (ESI) available: Experimental section and supporting data. See DOI: 10.1039/c7cc00928c

Biofilms present challenges to numerous industries. Herein, a simple approach was developed based on chloride-accelerated Fenton chemistry, where copper oxide nanoparticles facilitate efficient generation of reactive chlorine species for biofilm removal. Chloride ions dramatically enhance the antiba...

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Hauptverfasser: Wang, Li, Miao, Yanni, Lu, Mingsheng, Shan, Zhi, Lu, Shan, Hou, Jiaojiao, Yang, Qiumei, Liang, Xinle, Zhou, Tao, Curry, Dennis, Oakes, Ken, Zhang, Xu
Format: Artikel
Sprache:eng
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Zusammenfassung:Biofilms present challenges to numerous industries. Herein, a simple approach was developed based on chloride-accelerated Fenton chemistry, where copper oxide nanoparticles facilitate efficient generation of reactive chlorine species for biofilm removal. Chloride ions dramatically enhance the antibacterial and anti-biofilm capability of Cu-based Fenton reagents.
ISSN:1359-7345
1364-548X
DOI:10.1039/c7cc00928c