Precise control of chemical vapor deposition graphene layer thickness using NixCu1−x alloysElectronic supplementary information (ESI) available. See DOI: 10.1039/c4tc01979b

We investigated a simple but effective method to precisely control the desired number of graphene layers on the Ni x Cu 1− x alloy substrates by thermal chemical vapor deposition. Our method could be utilized to precisely control the number of graphene layers without altering growth conditions such...

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Hauptverfasser: Choi, Hyonkwang, Lim, Yeongjin, Park, Minjeong, Lee, Sehui, Kang, Younsik, Kim, Min Su, Kim, Jeongyong, Jeon, Minhyon
Format: Artikel
Sprache:eng
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