Tailoring of the carbon nanowall microstructure by sharp variation of plasma radical compositionElectronic supplementary information (ESI) available. See DOI: 10.1039/c4cp03956d

In this paper we propose a new and simple method to tune the carbon nanowall microstructure by sharp variation of CH 4 /H 2 plasma conditions. Using theoretical calculations we demonstrated that the sharp variation of gas pressure and discharge current leads to significant variation of plasma radica...

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Hauptverfasser: Mironovich, Kirill V, Itkis, Daniil M, Semenenko, Dmitry A, Dagesian, Sarkis A, Yashina, Lada V, Kataev, Elmar Yu, Mankelevich, Yuri A, Suetin, Nikolay V, Krivchenko, Victor A
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Sprache:eng
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Zusammenfassung:In this paper we propose a new and simple method to tune the carbon nanowall microstructure by sharp variation of CH 4 /H 2 plasma conditions. Using theoretical calculations we demonstrated that the sharp variation of gas pressure and discharge current leads to significant variation of plasma radical composition. In some cases such perturbation creates the necessary conditions for the nucleation of smaller secondary nanowalls on the surface of primary ones. In this paper we propose a new and simple method to tune the carbon nanowall microstructure by sharp variation of CH 4 /H 2 plasma conditions.
ISSN:1463-9076
1463-9084
DOI:10.1039/c4cp03956d