Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel moldsElectronic supplementary information (ESI) available: The conceptual drawing, optical design, and system construction for FLB-NIL. See DOI: 10.1039/c3lc50202c

We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior. We present a nanoimprint lithography process with a focused laser beam for the fabrication of nanopatterned microchannel molds.