Hydrogen as an optimum reducing agent for metallization of self-assembled monolayersElectronic supplementary information (ESI) available. See DOI: 10.1039/c2jm32111d
We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd 2+ on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be ob...
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Sprache: | eng |
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Zusammenfassung: | We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd
2+
on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be obtained. Moreover, this work is the first experimental demonstration of hydrogen adsorption on Pd adlayers.
Metallization of organic monolayer surfaces has been facilitated
via
hydrogen reduction of coordinated metal cations. |
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ISSN: | 0959-9428 1364-5501 |
DOI: | 10.1039/c2jm32111d |