Hydrogen as an optimum reducing agent for metallization of self-assembled monolayersElectronic supplementary information (ESI) available. See DOI: 10.1039/c2jm32111d

We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd 2+ on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be ob...

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Hauptverfasser: Muglali, Mutlu I, Bashir, Asif, Birkner, Alexander, Rohwerder, Micheal
Format: Artikel
Sprache:eng
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Zusammenfassung:We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd 2+ on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be obtained. Moreover, this work is the first experimental demonstration of hydrogen adsorption on Pd adlayers. Metallization of organic monolayer surfaces has been facilitated via hydrogen reduction of coordinated metal cations.
ISSN:0959-9428
1364-5501
DOI:10.1039/c2jm32111d