Bonding situation and NO-bond strengths in amine-N-oxidesa combined experimental and theoretical studyElectronic supplementary information (ESI) available. See DOI: 10.1039/c2cp22341d
The bonding situation and energetics of the NO bond in a series of amine- N -oxides, Ph x (CH 3 ) 3 x NO, where x = 03, were analyzed experimentally and theoretically. There is a notable nearly linear decrease of the NO bond dissociation energies (BDEs) for this series with an increasing number of p...
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Zusammenfassung: | The bonding situation and energetics of the NO bond in a series of amine-
N
-oxides, Ph
x
(CH
3
)
3
x
NO, where
x
= 03, were analyzed experimentally and theoretically. There is a notable nearly linear decrease of the NO bond dissociation energies (BDEs) for this series with an increasing number of phenyl groups
x
. This was investigated experimentally by X-ray high angle multipole refinement techniques in combination with subsequent topological analysis of the electron density for the representative (CH
3
)
2
PhNO,
2
, and complementary theoretical calculations at the DFT and multireference CASSCF and MR-perturbation theory (MCQDPT2) levels. Both the theoretical and experimental results unambiguously revealed a polar covalent -bond for the NO bond with an essentially identical bonding situation for all amine-
N
-oxides studied. This apparent disparity between the bonding situation and the trend of BDEs is attributed to the large differences of the relaxation energies of the corresponding amines Ph
x
(CH
3
)
3
x
N, (
x
= 03), respectively, the required preparation energies (
E
prep
) for the reverse NO bond forming process. The detailed theoretical analysis of the amines allowed us to trace the trend of larger values of
E
prep
for a higher number of phenyl groups
x
to an increase of
n
(N) *(CC) delocalization interactions.
The bonding situation and energetics of the NO bond in a series of amine-
N
-oxides, Ph
x
(CH
3
)
3
x
NO, where
x
= 03, were analyzed experimentally and theoretically. |
---|---|
ISSN: | 1463-9076 1463-9084 |
DOI: | 10.1039/c2cp22341d |