Graphene-carbon 2D heterostructures with hierarchically-porous P,N-doped layered architecture for capacitive deionization
Exploring a new-family of carbon-based desalinators to optimize their performances beyond the current commercial benchmark is of significance for the development of practically useful capacitive deionization (CDI) materials. Here, we have fabricated a hierarchically porous N,P-doped carbon-graphene...
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Veröffentlicht in: | Chemical science (Cambridge) 2021-08, Vol.12 (3), p.1334-134 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Exploring a new-family of carbon-based desalinators to optimize their performances beyond the current commercial benchmark is of significance for the development of practically useful capacitive deionization (CDI) materials. Here, we have fabricated a hierarchically porous N,P-doped carbon-graphene 2D heterostructure (denoted NPC/rGO) by using metal-organic framework (MOF)-nanoparticle-driven assembly on graphene oxide (GO) nanosheets followed by stepwise pyrolysis and phosphorization procedures. The resulting NPC/rGO-based CDI desalinator exhibits ultrahigh deionization performance with a salt adsorption capacity of 39.34 mg g
−1
in a 1000 mg L
−1
NaCl solution at 1.2 V over 30 min with good cycling stability over 50 cycles. The excellent performance is attributed to the high specific surface area, high conductivity, favorable meso-/microporous structure together with nitrogen and phosphorus heteroatom co-doping, all of which are beneficial for the accommodation of ions and charge transport during the CDI process. More importantly, NPC/rGO exhibits a state-of-the-art CDI performance compared to the commercial benchmark and most of the previously reported carbon materials, highlighting the significance of the MOF nanoparticle-driven assembly strategy and graphene-carbon 2D heterostructures for CDI applications.
MOF nanoparticle-driven assembly on 2D nanosheets produces the graphene-carbon heterostructure with hierarchically-porous P,N-doped layered architecture. |
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ISSN: | 2041-6520 2041-6539 |
DOI: | 10.1039/d1sc00915j |