Toward automated classification of monolayer versus few-layer nanomaterials using texture analysis and neural networks

The need for a fast and robust method to characterize nanostructure thickness is growing due to the tremendous number of experiments and their associated applications. By automatically analyzing the microscopic image texture of MoS 2 and WS 2 , it was possible to distinguish monolayer from few-layer nanostructures with high accuracy for both materials. Three methods of texture analysis (TA) were used: grey level histogram (GLH), grey levels co-occurrence matrix (GLCOM), and run-length matrix (RLM), which correspond to first, second, and higher-order statistical methods, respectively. The best discriminating features were automatically selected using the Fisher coefficient, for each method, and used as a base for classification. Two classifiers were used: artificial neural networks (ANN), and linear discriminant analysis (LDA). RLM with ANN was found to give high classification accuracy, which was 89% and 95% for MoS 2 and WS 2 , respectively. The result of this work suggests that RLM, as a higher-order TA method, associated with an ANN classifier has a better ability to quantify and characterize the microscopic structure of nanolayers, and, therefore, categorize thickness to the proper class.