Analysis of the cuticular wax composition and ecophysiological studies in an arid plant - Ziziphus nummularia (Burm.f.) Wight & Arn

Plants in arid regions are exposed to various abiotic stresses and the presence of the waxy cuticular layer acts as a defensive barrier, which consists mainly of long chain fatty acids, hydrocarbons and other derived compounds. Studies on the chemical composition and properties of cuticles of arid plants are scanty. The present study deals with the analysis of cuticular wax composition and effect of temperature on some ecophysiological parameters of an important arid plant Ziziphus nummularia. A total of 59 different wax compounds were detected from the leaf cuticle by capillary GC–MS. 4-Hydroxycyclohexanone, Heptacosane and 2,7-Dimethyloctane-3,5-dione were the dominant wax compounds in Z. nummularia. The variation of photosynthetic rate varied from 0.70 to 7.70 µmol CO2 m-2s-1 against the studied temperature range of 15–55 °C. The transpiration rate varies from 1.80 to 8.40 mmol H2O m-2s-1 within the temperature range of 15–55 °C. The quantum yield of photosystem II (Fv/Fm) also exhibited much variation due to the variation of temperature. The results clearly shows that Z. nummularia is highly adapted to restrict water loss and can tolerate high temperatures and can be considered as an appropriate species for vegetating the arid areas.