Defect-assisted plasmonic crystal sensor

We demonstrate enhanced sensitivity of a nanostructured plasmonic sensor that utilizes resonance in intentional structural defects within a plasmonic crystal. The measured sensitivity of the fabricated nanosensor is ~500 nm/RIU showing improvement over traditional nanohole array sensors. Furthermore...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Optics letters 2013-07, Vol.38 (14), p.2569-2571
Hauptverfasser: Briscoe, Jayson L, Cho, Sang-Yeon, Brener, Igal
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We demonstrate enhanced sensitivity of a nanostructured plasmonic sensor that utilizes resonance in intentional structural defects within a plasmonic crystal. The measured sensitivity of the fabricated nanosensor is ~500 nm/RIU showing improvement over traditional nanohole array sensors. Furthermore, the defects provide an additional design parameter to increase sensitivity by engineering plasmon lifetime.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.38.002569