Ultra-broadband and high-responsive photodetectors based on bismuth film at room temperature

Bismuth (Bi) has undergone researches for dozens of years on account of its abundant physics including the remarkably high mobility, exceptional large positive magnetoresistance and the coexistence of an insulating interior as well as metallic surfaces. Very recently, two-dimensional topologically-p...

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Veröffentlicht in:Scientific reports 2015-07, Vol.5 (1), p.12320-12320, Article 12320
Hauptverfasser: Yao, J. D., Shao, J. M., Yang, G. W.
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Sprache:eng
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Zusammenfassung:Bismuth (Bi) has undergone researches for dozens of years on account of its abundant physics including the remarkably high mobility, exceptional large positive magnetoresistance and the coexistence of an insulating interior as well as metallic surfaces. Very recently, two-dimensional topologically-protected surface states immune to nonmagnetic perturbation such as surface oxidation and impurity scattering were experimentally demonstrated through systematic magnetotransport measurements, e.g. weak antilocalization effect and angular dependent Shubnikov-de Haas oscillations. Such robust metallic surface states, which are efficient in carrier transportation, along with its small bulk gap (14 meV) make Bi favored for high-responsive broadband photodetection. Here, we for the first time demonstrate the stable ultra-broadband photoresponse from 370 nm to 1550 nm with good reproducibility at room temperature based on a Bi photodetector. The fabricated device’s responsivity approaches 250 mA/W, accompanied with a rise time of 0.9 s and a decay time of 1.9 s. The photocurrent is linear dependent on the voltage and incident power, offering good tunability for multi-purpose applications. Thickness-dependent conductance and photocurrent reveal that the bulk is the optically active layer while the surface channel is responsible for carrier transportation. These findings pave an avenue to develop ultra-broadband Bi photodetectors for the next-generation multifunctional optoelectronic devices.
ISSN:2045-2322
2045-2322
DOI:10.1038/srep12320