Integrated digital inverters based on two-dimensional anisotropic ReS2 field-effect transistors
Semiconducting two-dimensional transition metal dichalcogenides are emerging as top candidates for post-silicon electronics. While most of them exhibit isotropic behaviour, lowering the lattice symmetry could induce anisotropic properties, which are both scientifically interesting and potentially us...
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Veröffentlicht in: | Nature communications 2015-05, Vol.6 (1), p.6991-6991, Article 6991 |
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Sprache: | eng |
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Zusammenfassung: | Semiconducting two-dimensional transition metal dichalcogenides are emerging as top candidates for post-silicon electronics. While most of them exhibit isotropic behaviour, lowering the lattice symmetry could induce anisotropic properties, which are both scientifically interesting and potentially useful. Here we present atomically thin rhenium disulfide (ReS
2
) flakes with unique distorted 1T structure, which exhibit in-plane anisotropic properties. We fabricated monolayer and few-layer ReS
2
field-effect transistors, which exhibit competitive performance with large current on/off ratios (∼10
7
) and low subthreshold swings (100 mV per decade). The observed anisotropic ratio along two principle axes reaches 3.1, which is the highest among all known two-dimensional semiconducting materials. Furthermore, we successfully demonstrated an integrated digital inverter with good performance by utilizing two ReS
2
anisotropic field-effect transistors, suggesting the promising implementation of large-scale two-dimensional logic circuits. Our results underscore the unique properties of two-dimensional semiconducting materials with low crystal symmetry for future electronic applications.
Many two-dimensional materials exhibit isotropic properties, but anisotropy can extend the functionality of future devices. Here, the authors fabricate field-effect transistors from single and few-layer rhenium disulfide and observe an anisotropic ratio of three to one along the two principle axes |
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ISSN: | 2041-1723 2041-1723 |
DOI: | 10.1038/ncomms7991 |