Valence band offset of β-Ga2O3/wurtzite GaN heterostructure measured by X-ray photoelectron spectroscopy

A sample of the β-Ga 2 O 3 /wurtzite GaN heterostructure has been grown by dry thermal oxidation of GaN on a sapphire substrate. X-ray diffraction measurements show that the β-Ga 2 O 3 layer was formed epitaxially on GaN. The valence band offset of the β-Ga 2 O 3 /wurtzite GaN heterostructure is mea...

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Veröffentlicht in:Nanoscale research letters 2012-10, Vol.7 (1), p.562-562, Article 562
Hauptverfasser: Wei, Wei, Qin, Zhixin, Fan, Shunfei, Li, Zhiwei, Shi, Kai, Zhu, Qinsheng, Zhang, Guoyi
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Sprache:eng
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Zusammenfassung:A sample of the β-Ga 2 O 3 /wurtzite GaN heterostructure has been grown by dry thermal oxidation of GaN on a sapphire substrate. X-ray diffraction measurements show that the β-Ga 2 O 3 layer was formed epitaxially on GaN. The valence band offset of the β-Ga 2 O 3 /wurtzite GaN heterostructure is measured by X-ray photoelectron spectroscopy. It is demonstrated that the valence band of the β-Ga 2 O 3 /GaN structure is 1.40 ± 0.08 eV.
ISSN:1556-276X
1931-7573
1556-276X
DOI:10.1186/1556-276X-7-562