Growth kinetics of MPS-capped CdS quantum dots in self-assembled thin films

For this study, we prepared colloidal CdS quantum dots using 3-mercaptopropyltrimethoxysilane as capping agent. Colloidal CdS quantum dots were directly deposited on glass substrates by a spin-coating process. Coated substrates were heat-treated between 225°C and 325°C for various heat treatment tim...

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Veröffentlicht in:Nanoscale research letters 2012-11, Vol.7 (1), p.610-610, Article 610
Hauptverfasser: Koç, Kenan, Tepehan, Fatma Z, Tepehan, Galip G
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Sprache:eng
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Zusammenfassung:For this study, we prepared colloidal CdS quantum dots using 3-mercaptopropyltrimethoxysilane as capping agent. Colloidal CdS quantum dots were directly deposited on glass substrates by a spin-coating process. Coated substrates were heat-treated between 225°C and 325°C for various heat treatment time intervals to investigate the growth kinetics of the quantum dots. Results showed that sizes of the CdS quantum dots grew approximately from 2.9 to 4.6 nm, and the E 1 s 1 s energy values shifted approximately from 3.3 to 2.7 eV. Results showed that the average size of quantum dots increase by thermal treatment due to Ostwald ripening. The thermal process used to grow the size of quantum dots was examined according to the Lifshitz-Slyozov-Wagner theory. The activation energy of CdS quantum dots in thin films was calculated at approximately 44 kJ/mol.
ISSN:1556-276X
1931-7573
1556-276X
DOI:10.1186/1556-276X-7-610