Ultrafast laser fabrication of submicrometer pores in borosilicate glass

We demonstrate rapid fabrication of submicrometer-diameter pores in borosilicate glass using femtosecond laser machining and subsequent wet-etch techniques. This approach allows direct and repeatable fabrication of high-quality pores with diameters of 400-800 nm. Such small pores coupled with the de...

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Veröffentlicht in:Optics letters 2008-05, Vol.33 (10), p.1153-1155
Hauptverfasser: RAN AN, URAM, Jeffrey D, YUSKO, Erik C, KE, Kevin, MAYER, Michael, HUNT, Alan J
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Sprache:eng
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Zusammenfassung:We demonstrate rapid fabrication of submicrometer-diameter pores in borosilicate glass using femtosecond laser machining and subsequent wet-etch techniques. This approach allows direct and repeatable fabrication of high-quality pores with diameters of 400-800 nm. Such small pores coupled with the desirable electrical and chemical properties of glass enable sensitive resistive-pulse analysis to determine the size and concentration of macromolecules and nanoparticles. Plasma-enhanced chemical vapor deposition allows further reduction of pore diameters to below 300 nm.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.33.001153