Ultrafast Laser Manipulation of In‐Lattice Plasmonic Nanoparticles (Adv. Sci. 38/2024)

In‐Lattice Plasmonic Nanolithography The scalable production of hybrid plasmonic materials on single‐crystalline substrates to achieve outstanding optical properties is a challenging task. In article number 2402840, Saulius Juodkazis, Feng Chen and colleagues introduce an advanced in‐lattice plasmonic nanolithography process for functional crystals, successfully fabricating nanorods that demonstrate robust polarization selectivity directly within the lattice. This innovative approach has the potential to customize on‐chip and in‐chip integrated micro‐nano photonic structures and devices with exceptional properties in functional materials and single‐crystal films.