Suppression of Short-Channel Effects in AlGaN/GaN HEMTs Using SiN x Stress-Engineered Technique

In this work, we present the novel application of SiN stress-engineering techniques for the suppression of short-channel effects in AlGaN/GaN high-electron-mobility transistors (HEMTs), accompanied by a comprehensive analysis of the underlying mechanisms. The compressive stress SiN passivation significantly enhances the barrier height at the heterojunction beneath the gate, maintaining it above the quasi-Fermi level even as rises to 20 V. As a result, in GaN devices with a gate length of 160 nm, the devices with compressive stress SiN passivation exhibit significantly lower drain-induced barrier lowering (DIBL) factors of 2.25 mV/V, 2.56 mV/V, 4.71 mV/V, and 3.84 mV/V corresponding to drain bias voltages of 5 V, 10 V, 15 V, and 20 V, respectively. Furthermore, as increases, there is an insignificant degradation in transconductance, subthreshold swing, leakage current, or output conductance. In contrast, the devices with stress-free passivation show relatively higher DIBL factors (greater than 20 mV/V) and substantial degradation in pinch-off performance and output characteristics. These results demonstrate that the SiN stress-engineering technique is an attractive technique to facilitate high-performance and high-reliability GaN-based HEMTs for radio frequency (RF) electronics applications.