Wetting state and mechanical property alteration for the Fe 3 Si films using rapid thermal annealing under various temperatures

The current research demonstrates the modification of the wetting behavior and mechanical features as well as structure and morphology of Fe Si films created via facing target sputtering by the rapid thermal annealing (RTA) with the set RTA temperatures ( ) of 200, 400, 600, and 800 °C. Following the RTA process, the crystallinity of Fe Si developed under 400 °C or below. At the 600 °C and 800 °C , new crystal orientations emerged for FeSi and then -FeSi , respectively. Together with composition results, the Fe Si films were proven to change into FeSi and then FeSi under a high regime. At temperatures of 600 °C and 800 °C, large crystallites, including the scraggly interface, were observed. The root-mean-square roughness roughened slightly according to the RTA process at of 600 °C or above. The hydrophobic properties of the Fe Si film surfaces became hydrophilic after the RTA procedure at a value above 400 °C. The hardness value of the Fe Si films evidently increased through RTA at 600 °C and 800 °C. Thus, above 400 °C, the RTA process significantly alters the physical features of as-created Fe Si films.