Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition

Rotational spatial plasma-enhanced atomic layer deposition has been used to deposit thin films on half-sphere lenses. Non-uniformity of less than +/- 1% is demonstrated for Nb2O5 deposited at 1.4 angstrom/s and for SiO2 deposited at 6 angstrom/s. (C) 2019 Optical Society of America

Bibliographische Detailangaben

Veröffentlicht in:	Applied optics (2004) 2020-02, Vol.59 (5), p.A16-A19
Hauptverfasser:	Dickey, Eric, Niiranen, Kalle, Danforth, Bryan, Barrow, William A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic layer epitaxy Niobium oxides Nonuniformity Optics Physical Sciences Science & Technology Silicon dioxide Thin films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!