Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition

Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition

Rotational spatial plasma-enhanced atomic layer deposition has been used to deposit thin films on half-sphere lenses. Non-uniformity of less than +/- 1% is demonstrated for Nb2O5 deposited at 1.4 angstrom/s and for SiO2 deposited at 6 angstrom/s. (C) 2019 Optical Society of America

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Bibliographische Detailangaben
Veröffentlicht in:Applied optics (2004) 2020-02, Vol.59 (5), p.A16-A19
Hauptverfasser: Dickey, Eric, Niiranen, Kalle, Danforth, Bryan, Barrow, William A.
Format: Artikel
Sprache:eng
Schlagworte:
Atomic layer epitaxy
Niobium oxides
Nonuniformity
Optics
Physical Sciences
Science & Technology
Silicon dioxide
Thin films
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Zusammenfassung:Rotational spatial plasma-enhanced atomic layer deposition has been used to deposit thin films on half-sphere lenses. Non-uniformity of less than +/- 1% is demonstrated for Nb2O5 deposited at 1.4 angstrom/s and for SiO2 deposited at 6 angstrom/s. (C) 2019 Optical Society of America
ISSN:1559-128X
2155-3165
1539-4522
DOI:10.1364/AO.59.000A16