Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition

Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition

Rotational spatial plasma-enhanced atomic layer deposition has been used to deposit thin films on half-sphere lenses. Non-uniformity of less than +/- 1% is demonstrated for Nb2O5 deposited at 1.4 angstrom/s and for SiO2 deposited at 6 angstrom/s. (C) 2019 Optical Society of America

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Veröffentlicht in:Applied optics (2004) 2020-02, Vol.59 (5), p.A16-A19
Hauptverfasser: Dickey, Eric, Niiranen, Kalle, Danforth, Bryan, Barrow, William A.
Format: Artikel
Sprache:eng
Schlagworte:
Atomic layer epitaxy
Niobium oxides
Nonuniformity
Optics
Physical Sciences
Science & Technology
Silicon dioxide
Thin films
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container_title Applied optics (2004)
container_volume 59
creator Dickey, Eric
Niiranen, Kalle
Danforth, Bryan
Barrow, William A.
description Rotational spatial plasma-enhanced atomic layer deposition has been used to deposit thin films on half-sphere lenses. Non-uniformity of less than +/- 1% is demonstrated for Nb2O5 deposited at 1.4 angstrom/s and for SiO2 deposited at 6 angstrom/s. (C) 2019 Optical Society of America
doi_str_mv 10.1364/AO.59.000A16
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subjects Atomic layer epitaxy
Niobium oxides
Nonuniformity
Optics
Physical Sciences
Science & Technology
Silicon dioxide
Thin films
title Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
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