A combined photoelectron spectroscopy and relativistic ab initio studies of the electronic structures of UFO and UFO

The observation of the gaseous UFO− anion is reported, which is investigated using photoelectron spectroscopy and relativisitic ab initio calculations. Two strong photoelectron bands are observed at low binding energies due to electron detachment from the U-7sσ orbital. Numerous weak detachment band...

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Veröffentlicht in:The Journal of chemical physics 2016-02, Vol.144 (8), p.084309-084309
Hauptverfasser: Roy, Soumendra K., Jian, Tian, Lopez, Gary V., Li, Wei-Li, Su, Jing, Bross, David H., Peterson, Kirk A., Wang, Lai-Sheng, Li, Jun
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Sprache:eng
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Zusammenfassung:The observation of the gaseous UFO− anion is reported, which is investigated using photoelectron spectroscopy and relativisitic ab initio calculations. Two strong photoelectron bands are observed at low binding energies due to electron detachment from the U-7sσ orbital. Numerous weak detachment bands are also observed due to the strongly correlated U-5f electrons. The electron affinity of UFO is measured to be 1.27(3) eV. High-level relativistic quantum chemical calculations have been carried out on the ground state and many low-lying excited states of UFO to help interpret the photoelectron spectra and understand the electronic structure of UFO. The ground state of UFO− is linear with an O–U–F structure and a 3H4 spectral term derived from a U 7sσ25fφ15fδ1 electron configuration, whereas the ground state of neutral UFO has a 4H7/2 spectral term with a U 7sσ15fφ15fδ1 electron configuration. Strong electron correlation effects are found in both the anionic and neutral electronic configurations. In the UFO neutral, a high density of electronic states with strong configuration mixing is observed in most of the scalar relativistic and spin-orbit coupled states. The strong electron correlation, state mixing, and spin-orbit coupling of the electronic states make the excited states of UFO very challenging for accurate quantum chemical calculations.
ISSN:0021-9606
1089-7690
DOI:10.1063/1.4942188