An investigation into the melting of silicon nanoclusters using molecular dynamics simulations
Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of t...
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Veröffentlicht in: | Nanotechnology 2005-02, Vol.16 (2), p.250-256 |
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description | Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T(m,N) = T(m,Bulk)-αN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T(m,Bulk) = 1821 K to a value of T(m,357) = 1380 K at the lower limit of the intermediate nanocrystal regime. |
doi_str_mv | 10.1088/0957-4484/16/2/012 |
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This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T(m,N) = T(m,Bulk)-αN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T(m,Bulk) = 1821 K to a value of T(m,357) = 1380 K at the lower limit of the intermediate nanocrystal regime.</description><identifier>ISSN: 0957-4484</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/0957-4484/16/2/012</identifier><identifier>PMID: 21727431</identifier><language>eng</language><publisher>England: IOP Publishing</publisher><ispartof>Nanotechnology, 2005-02, Vol.16 (2), p.250-256</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c374t-a5005e32eb37dba4dfa1aff1c0d761de1043d4158cca875d849785adcd1393b53</citedby><cites>FETCH-LOGICAL-c374t-a5005e32eb37dba4dfa1aff1c0d761de1043d4158cca875d849785adcd1393b53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0957-4484/16/2/012/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27903,27904,53809,53889</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/21727431$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Fang, Kuan-Chuan</creatorcontrib><creatorcontrib>Weng, Cheng-I</creatorcontrib><title>An investigation into the melting of silicon nanoclusters using molecular dynamics simulations</title><title>Nanotechnology</title><addtitle>Nanotechnology</addtitle><description>Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T(m,N) = T(m,Bulk)-αN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T(m,Bulk) = 1821 K to a value of T(m,357) = 1380 K at the lower limit of the intermediate nanocrystal regime.</description><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNp9kM1OwzAQhC0EoqXwAhxQbohDiNd2EudYVfxJlbjAFcuxnWKUxCFOkPr2OGrppRKnlXe-GWsHoWvA94A5T3CR5jFjnCWQJSTBQE7QHGgGcZYSformB2CGLrz_whiAEzhHMwI5yRmFOfpYtpFtf4wf7EYO1k2vwUXDp4kaUw-23USuirytrQpaK1un6tEPpvfR6Ce1cbVRYy37SG9b2VjlA92ExRTmL9FZJWtvrvZzgd4fH95Wz_H69elltVzHiuZsiGWKcWooMSXNdSmZriTIqgKFdZ6BNoAZ1QxSrpTkeao5K3KeSq000IKWKV2g211u17vvMVwjGuuVqWvZGjd6EUw4o0W4eYHIjlS98743leh628h-KwCLqVYxtSam1gRkgohQazDd7OPHsjH6YPnrMQB3O8C67qAeB4lOV4GNj9l_Pv8FFi2PYQ</recordid><startdate>20050201</startdate><enddate>20050201</enddate><creator>Fang, Kuan-Chuan</creator><creator>Weng, Cheng-I</creator><general>IOP Publishing</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20050201</creationdate><title>An investigation into the melting of silicon nanoclusters using molecular dynamics simulations</title><author>Fang, Kuan-Chuan ; Weng, Cheng-I</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c374t-a5005e32eb37dba4dfa1aff1c0d761de1043d4158cca875d849785adcd1393b53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fang, Kuan-Chuan</creatorcontrib><creatorcontrib>Weng, Cheng-I</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fang, Kuan-Chuan</au><au>Weng, Cheng-I</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An investigation into the melting of silicon nanoclusters using molecular dynamics simulations</atitle><jtitle>Nanotechnology</jtitle><addtitle>Nanotechnology</addtitle><date>2005-02-01</date><risdate>2005</risdate><volume>16</volume><issue>2</issue><spage>250</spage><epage>256</epage><pages>250-256</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><abstract>Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T(m,N) = T(m,Bulk)-αN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T(m,Bulk) = 1821 K to a value of T(m,357) = 1380 K at the lower limit of the intermediate nanocrystal regime.</abstract><cop>England</cop><pub>IOP Publishing</pub><pmid>21727431</pmid><doi>10.1088/0957-4484/16/2/012</doi><tpages>7</tpages></addata></record> |
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title | An investigation into the melting of silicon nanoclusters using molecular dynamics simulations |
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