An investigation into the melting of silicon nanoclusters using molecular dynamics simulations

Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of t...

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Veröffentlicht in:Nanotechnology 2005-02, Vol.16 (2), p.250-256
Hauptverfasser: Fang, Kuan-Chuan, Weng, Cheng-I
Format: Artikel
Sprache:eng
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Zusammenfassung:Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T(m,N) = T(m,Bulk)-αN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T(m,Bulk) = 1821 K to a value of T(m,357) = 1380 K at the lower limit of the intermediate nanocrystal regime.
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/16/2/012