Design and validation of 0.25 (mu m) integrated circuit yield model

Significant effort has been made to derive credible tool targets for the tool set for the SEMATECH 0.25 micrometer logic process. Besides using real manufacturing data from 0.30 micrometers to 0.50 micrometers process technologies from 3 SEMATECH member companies, tool development experts at SEMATEC...

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Veröffentlicht in:	Semiconductor international 1998-06, Vol.21 (6), p.195
Hauptverfasser:	Lakhani, Fred, Dance, Daren L, Williams, Randy
Format:	Magazinearticle
Sprache:	eng
Schlagworte:	Confidence intervals Estimates Guidelines Integrated circuits Manufacturing Studies Yield
Online-Zugang:	Volltext
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