Atomic force microscopy enhances chemical mechanical polishing

Atomic force microscopy enhances chemical mechanical polishing

Atomic force microscopy (AFM) is a very sensitive tool for measuring the 3-dimensional morphology of a semiconductor wafer. It provides important information for use in process development and process control in a semiconductor wafer fab CMP process. AFT data can provide high resolution images to en...

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Veröffentlicht in:Semiconductor international 1996-12, Vol.19 (14), p.81
Hauptverfasser: Strausser, Yale E, Hetherington, Dale L
Format: Magazinearticle
Sprache:eng
Schlagworte:
Charged particles
Height
Measuring instruments
Process engineering
Product development
Scanning electron microscopy
Semiconductors
Topography
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Zusammenfassung:Atomic force microscopy (AFM) is a very sensitive tool for measuring the 3-dimensional morphology of a semiconductor wafer. It provides important information for use in process development and process control in a semiconductor wafer fab CMP process. AFT data can provide high resolution images to enable the process engineer to visualize what is happening in the process or can be automatically reduced to produce cross-wafer maps of important parameters. With TappingMode, AFM can provide feedback with short turnaround times.
ISSN:0163-3767