High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation

High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation

Silicon splits: The application of silicon to water oxidation is limited due to unfavorable interface properties. However, these can be circumvented by using a high‐performance silicon photoanode with a catalytically active iron oxide thin film (see picture). This approach results in photocurrents a...

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Veröffentlicht in:Angewandte Chemie International Edition 2012-01, Vol.51 (2), p.423-427
Hauptverfasser: Jun, Kimin, Lee, Yun Seog, Buonassisi, Tonio, Jacobson, Joseph M.
Format: Artikel
Sprache:eng
Schlagworte:
electrochemistry
photoelectrodes
semiconductors
silicon
water oxidation
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Zusammenfassung:Silicon splits: The application of silicon to water oxidation is limited due to unfavorable interface properties. However, these can be circumvented by using a high‐performance silicon photoanode with a catalytically active iron oxide thin film (see picture). This approach results in photocurrents as high as 17 mA cm−2 under 1 sun and zero overpotential conditions.
ISSN:1433-7851
1521-3773
DOI:10.1002/anie.201104367