Method to improve high-frequency magnetic characteristics of Fe₈₀Ni₂₀–O alloy films by introducing low-dose oxygen
In this letter, we propose a method to fabricate Fe₈₀Ni₂₀–O film with improved static and high-frequency, magnetic and electrical properties. Fe₈₀Ni₂₀–O alloy films were prepared by direct current magnetron sputtering at room temperature. The results show that the in-plane uniaxial magnetic anisotro...
Gespeichert in:
Veröffentlicht in: | Materials letters 2012-01, Vol.67 (1), p.99-102 |
---|---|
Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | In this letter, we propose a method to fabricate Fe₈₀Ni₂₀–O film with improved static and high-frequency, magnetic and electrical properties. Fe₈₀Ni₂₀–O alloy films were prepared by direct current magnetron sputtering at room temperature. The results show that the in-plane uniaxial magnetic anisotropy fields can be adjusted in a broad range by solely adding a very low dose of oxygen into Fe₈₀Ni₂₀ alloy films without applying any inducing field on substrates during deposition. By increasing the oxygen flow ratio from 0.75% to 3%, Fe₈₀Ni₂₀–O alloy films could be achieved with an adjustable ferromagnetic resonance frequency fᵣ (from 2.2 to 5.9GHz), a large saturation magnetization 4πMs (from 16.7 to 15.2kG), and a high resistivity ρ (from 56.7 to 108μΩcm). |
---|---|
ISSN: | 0167-577X 1873-4979 |
DOI: | 10.1016/j.matlet.2011.09.064 |