An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide

► The undercutting model of polymer covered with protective film induced by AO was defined. ► The AO erosion mechanism of polyimide has been investigated using a ground-based AO simulator and Monte Carlo model. ► AO erosion predictions at two neighborhood cracks is first studied by Monte Carlo model. ► Multilayer silica/alumina films were created by plasma immersion implantation and deposition for protection against AO. Multilayer silica/alumina films were created by plasma immersion implantation and deposition to protect against atomic oxygen (AO) in low earth orbit environment. The AO erosion mechanism of polyimide under multilayer silica/alumina films has been investigated using a ground-based AO simulator and Monte Carlo model. The results demonstrate that protective films are detached and plumped due to AO undercutting, and the exterior silica film is partly detached proven by chemical composition depth profile and erosion patterns. The undercutting model involving collision, diffusion, reaction, gas releasing, and retroaction on films is proposed. Based on the model, scattered impingement has serious erosion, although AO does not directly attack interior polymer. AO erosion predictions at two neighborhood cracks are first studied by Monte Carlo model for various incidence angles of AO. The protective film between cracks hinders the escape of AO, and accelerates the erosion.