FeSi THIN FILMS DEVELOPED BY PULSED LASER DEPOSITION

FeSi THIN FILMS DEVELOPED BY PULSED LASER DEPOSITION

This paper presents some results on FeSi thin films deposited by pulsed laser deposition on silicon, platinum covered silicon, quartz, SITAL ceramic and glass (type BK7) substrates. The influence of the deposition parameters (background pressure, laser wavelength, laser fluence) on the structure and...

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Veröffentlicht in:Scientific bulletin. Series B, Chemistry and materials science Chemistry and materials science, 2011-01, Vol.73 (2), p.231-240
Hauptverfasser: Constantinescu, Catalin, Gavrila, Horia
Format: Artikel
Sprache:eng
Schlagworte:
Ceramics
Deposition
Lasers
Magnetic properties
Pulsed laser deposition
Silicon substrates
Thin films
Wavelengths
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Zusammenfassung:This paper presents some results on FeSi thin films deposited by pulsed laser deposition on silicon, platinum covered silicon, quartz, SITAL ceramic and glass (type BK7) substrates. The influence of the deposition parameters (background pressure, laser wavelength, laser fluence) on the structure and morphology of the thin films was studied: the thin film superficial and thin film-substrate interface characteristics, the electrical and magnetic properties were particularly investigated from this perspective.
ISSN:1454-2331