Features of formation of germanium silicate glasses during oxidation of nanostructured films of germanium-doped polycrystalline silicon

Nanostructured films of polycrystalline silicon obtained by joint pyrolysis of monosilane (SiH 4 ) and monogermane (GeH 4 ) were oxidized in a medium of dry and wet oxygen. As a result of their oxidation, vitreous films of complex oxides of germanium and silicon, germanium silicate glass (GSG), is formed. It is established that the presence of germanium in the composition of nanostructured films of polycrystalline silicon (NSF PCS) increases their reaction ability with respect to oxidation. Using the methods of IR spectroscopy, XPE spectroscopy, Auger spectroscopy, and thermal analysis, the composition and phase transformation of vitreous oxides formed in the course of oxidation of NSF PCS are investigated. It is shown that the composition and phase transformation of the films of vitreous silicon and germanium oxides depend on the germanium content in the NSF PCS and conditions of their oxidation.