Investigations on the structural, optical and electrical properties of Nb-doped SnO2 thin films

Niobium-doped tin oxide thin films were deposited on glass substrates by the chemical spray pyrolysis method at a substrate temperature of 400 °C. Effects of Nb doping on the structural, electrical and optical properties have been investigated as a function of niobium concentration (0–2 at.%) in the spray solution. X-ray diffraction patterns showed that the films are polycrystalline in nature and the preferred growth direction of the undoped film shifts to (200) for Nb-doped films. Atomic force microscopy study shows that the surface morphology of these films vary when doping concentration varies. The negative sign of Hall coefficient confirmed the n-type conductivity. Resistivity of ~4.3 × 10 −3 Ω cm, carrier concentration of ~5 × 10 19 cm −3 , mobility of ~25 cm 2 V −1 s −1 and an average optical transmittance of ~70% in the visible region (500–800 nm) were obtained for the film doped with 0.5 at.% niobium.