Effect of Cr incorporation on the structural and optoelectronic properties of TiO2:Cr deposited by means of a magnetron co-sputtering process

In this work, we report on the effect of Cr incorporation on the microstructural and optical properties of TiO2:Cr thin films deposited by the RF-magnetron sputtering method. The structural, morphological, chemical bonding and optoelectronic properties of the sputter-deposited TiO2:Cr films were sys...

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Veröffentlicht in:	Applied surface science 2011-10, Vol.257 (24), p.10351-10357
Hauptverfasser:	HAJJAJI, A, GAIDI, M, BESSAIS, B, EI KHAKANI, M. A
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic force microscopy Chromium Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition Diffraction Exact sciences and technology Optoelectronics Physics Titanium dioxide X-ray photoelectron spectroscopy X-rays
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Zusammenfassung:	In this work, we report on the effect of Cr incorporation on the microstructural and optical properties of TiO2:Cr thin films deposited by the RF-magnetron sputtering method. The structural, morphological, chemical bonding and optoelectronic properties of the sputter-deposited TiO2:Cr films were systematically investigated, as a function the incorporated Cr content, by means of various techniques including X-ray diffraction (XRD), atomic force microscopy (AFM), Fourier-Transform Infra-Red (FTIR) absorption, X-ray Photoelectron Spectroscopy (XPS) and ellipsometry. The Cr incorporation into the TiO2 films was controlled by adjusting the RF power (P
ISSN:	0169-4332 1873-5584
DOI:	10.1016/j.apsusc.2011.06.072