Effect of ammoniating temperature on microstructure of one-dimensional GaN nanorods with Tb intermediate layer
GaN nanorods have been successfully synthesized on Si (111) substrates by magnetron sputtering through ammoniating Ga 2 O 3 /Tb thin films. The influence of ammonating temperatures on microstructure, morphology and light emitting properties of GaN nanorods was ananlyzed in detail using X-ray diffrac...
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Veröffentlicht in: | Journal of materials science. Materials in electronics 2011-09, Vol.22 (9), p.1366-1371 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | GaN nanorods have been successfully synthesized on Si (111) substrates by magnetron sputtering through ammoniating Ga
2
O
3
/Tb thin films. The influence of ammonating temperatures on microstructure, morphology and light emitting properties of GaN nanorods was ananlyzed in detail using X-ray diffraction, X-ray photoelectron spectroscopy, FT-IR spectrophotometer, scanning electron microscopy, high- resolution transmission electron microscopy, and photoluminescence spectroscopy. The results demonstrate that the GaN nanorods are single crystalline and exhibit hexagonal wurtzite symmetry. The highest crystalline quality was achieved at 950 °C for 15 min with the size of 100–150 nm in diameter, which have an excellent light emitting properties. A small red-shift occurs due to band-gap change caused by the tensile stress. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-011-0315-z |