Effect of ammoniating temperature on microstructure of one-dimensional GaN nanorods with Tb intermediate layer

GaN nanorods have been successfully synthesized on Si (111) substrates by magnetron sputtering through ammoniating Ga 2 O 3 /Tb thin films. The influence of ammonating temperatures on microstructure, morphology and light emitting properties of GaN nanorods was ananlyzed in detail using X-ray diffrac...

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Veröffentlicht in:Journal of materials science. Materials in electronics 2011-09, Vol.22 (9), p.1366-1371
Hauptverfasser: Shi, Feng, Xue, Chengshan
Format: Artikel
Sprache:eng
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Zusammenfassung:GaN nanorods have been successfully synthesized on Si (111) substrates by magnetron sputtering through ammoniating Ga 2 O 3 /Tb thin films. The influence of ammonating temperatures on microstructure, morphology and light emitting properties of GaN nanorods was ananlyzed in detail using X-ray diffraction, X-ray photoelectron spectroscopy, FT-IR spectrophotometer, scanning electron microscopy, high- resolution transmission electron microscopy, and photoluminescence spectroscopy. The results demonstrate that the GaN nanorods are single crystalline and exhibit hexagonal wurtzite symmetry. The highest crystalline quality was achieved at 950 °C for 15 min with the size of 100–150 nm in diameter, which have an excellent light emitting properties. A small red-shift occurs due to band-gap change caused by the tensile stress.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-011-0315-z