AFM fabrication and characterization of nanoscale Al sub(2)O sub(3) patterns

AFM fabrication and characterization of nanoscale Al sub(2)O sub(3) patterns

In this paper the atomic force microscopy (AFM) fabrication of nanoscale Al sub(2)O sub(3) patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO sub(2) surface layer. The effects of applied voltage and scanning speed on obtained Al sub(2)O sub(3) pat...

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Veröffentlicht in:Journal of materials science. Materials in electronics 2009-02, Vol.20 (2), p.177-180
Hauptverfasser: Jiao, Zheng, Zhang, Haijiao, Wu, Minghong, Guo, Huijiao, Wang, Jia, Zhao, Bing, Ding, Guoji
Format: Artikel
Sprache:eng
Schlagworte:
Aluminum oxide
Arrays
Atomic force microscopy
Electronics
Nanocomposites
Nanomaterials
Nanostructure
Voltage
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Zusammenfassung:In this paper the atomic force microscopy (AFM) fabrication of nanoscale Al sub(2)O sub(3) patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO sub(2) surface layer. The effects of applied voltage and scanning speed on obtained Al sub(2)O sub(3) pattern were evaluated and the anodic oxidation mechanism was discussed.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-008-9678-1