Influence of magnetic annealing on high-frequency magnetic properties of FeCoNd films

► FeCoNd thin film with thickness of 166 nm shows the perpendicular anisotropy. ► Perpendicular anisotropy decreases as annealing temperature increases from RT to 573 K. ► In-plane uniaxial anisotropy is achieved as annealing temperature above 400 °C. ► The resonance absorption phenomena around giga...

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Veröffentlicht in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2011-09, Vol.176 (16), p.1317-1321
Hauptverfasser: Xi, L., Li, X.Y., Zhou, J.J., Du, J.H., Ma, J.H., Wang, Z., Lu, J.M., Zuo, Y.L., Xue, D.S., Li, F.S.
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Sprache:eng
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Zusammenfassung:► FeCoNd thin film with thickness of 166 nm shows the perpendicular anisotropy. ► Perpendicular anisotropy decreases as annealing temperature increases from RT to 573 K. ► In-plane uniaxial anisotropy is achieved as annealing temperature above 400 °C. ► The resonance absorption phenomena around gigahertz were observed for FeCoNd films. ► The as deposited FeCoNd films have much potential for high-frequency application. FeCoNd thin film with thickness of 166 nm has been fabricated on silicon (1 1 1) substrates by magnetron co-sputtering and annealed for one hour under magnetic field at different temperatures ( T a) from 200 °C to 700 °C. The As-deposited and annealed FeCoNd film samples at T a ≤ 500 °C were amorphous while the ones obtained at T a ≥ 600 °C were crystallized. We found that the perpendicular anisotropy field gradually decreases as the annealing temperature increases from room temperature to 300 °C. A well induced in-plane uniaxial anisotropy is achieved at the annealing temperature between 400 and 600 °C. The variation of the dynamic magnetic properties of annealed FeCoNd films can be well explained by the Landau–Lifshitz equation with the variation of the anisotropy field re-distribution and the damping constant upon magnetic annealing. The magnetic annealing might be a powerful post treatment method for high frequency application of magnetic thin films.
ISSN:0921-5107
1873-4944
DOI:10.1016/j.mseb.2011.07.010