Unmasking Photolithography: A Versatile Way to Site-Selectively Pattern Gold Substrates

Surface chemistry: A new method for creating complex patterns on gold substrates is reported. Substrates were functionalized with nitroveratryl‐protected carboxylic acid and hydroxy‐terminated thiol monomers and patterned with a direct‐write photolithography system to produce complex functional grou...

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Veröffentlicht in:Angewandte Chemie International Edition 2012-02, Vol.51 (9), p.2151-2154
Hauptverfasser: Hynes, Matthew J., Maurer, Joshua A.
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description Surface chemistry: A new method for creating complex patterns on gold substrates is reported. Substrates were functionalized with nitroveratryl‐protected carboxylic acid and hydroxy‐terminated thiol monomers and patterned with a direct‐write photolithography system to produce complex functional group gradients. In addition, two amine molecules were sequentially coupled on the substrate under spatial control (see picture).
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subjects Amines
Carboxylic acids
Carboxylic Acids - chemistry
Coupling (molecular)
Functional groups
Functionally gradient materials
Gold
Gold - chemistry
Microscopy, Scanning Probe
monolayers
Monomers
Photochemistry
Photolithography
scanning probe microscopy
Sulfhydryl Compounds - chemistry
Surface chemistry
Surface Properties
title Unmasking Photolithography: A Versatile Way to Site-Selectively Pattern Gold Substrates
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