Unmasking Photolithography: A Versatile Way to Site-Selectively Pattern Gold Substrates

Surface chemistry: A new method for creating complex patterns on gold substrates is reported. Substrates were functionalized with nitroveratryl‐protected carboxylic acid and hydroxy‐terminated thiol monomers and patterned with a direct‐write photolithography system to produce complex functional grou...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Angewandte Chemie International Edition 2012-02, Vol.51 (9), p.2151-2154
Hauptverfasser:	Hynes, Matthew J., Maurer, Joshua A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Amines Carboxylic acids Carboxylic Acids - chemistry Coupling (molecular) Functional groups Functionally gradient materials Gold Gold - chemistry Microscopy, Scanning Probe monolayers Monomers Photochemistry Photolithography scanning probe microscopy Sulfhydryl Compounds - chemistry Surface chemistry Surface Properties
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Surface chemistry: A new method for creating complex patterns on gold substrates is reported. Substrates were functionalized with nitroveratryl‐protected carboxylic acid and hydroxy‐terminated thiol monomers and patterned with a direct‐write photolithography system to produce complex functional group gradients. In addition, two amine molecules were sequentially coupled on the substrate under spatial control (see picture).
ISSN:	1433-7851 1521-3773
DOI:	10.1002/anie.201107671